Al Damage-Free Si Etching Solution (Anisotropic)
Al and Al alloy films are anisotropically etched well without corrosion.
The features of this product are as follows: - It enables the formation of a smooth etching surface. - Etching can be performed regardless of the metal opening ratio on the device surface. - There is minimal degradation of the etching solution. - It is recommended to use Pure Etch ZE series (Al damage-free insulating film etching solution) as a pretreatment solution. Keywords: wet etching, silicon anisotropic etching
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
